Physical Deposition System Plasma Cleaner For Wafers
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Model no.
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OLT-PS-10L
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OLT-PS-P5L
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OLT-PS-2LA
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OLT-PS-2L-B
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Display
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LCD touch screen
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LED button screen
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Power supply
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AC 108V-240V 50Hz
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Working current
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plasma cleaner working current less than 1.2A
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Radio frequency power
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100-400w, adjustable
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< 200w, adjustable, or customized
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RF frequency
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13.56MHz(offset less than 0.4KHz)
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40KHz(offset less than 0.2KHz)
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Characteristic impedance
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50 Ohm,automatch
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Chamber capacity
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10L
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5L
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2L
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2L
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Vacuum degree
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60Pa-100Pa
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10Pa-100Pa
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30Pa-100Pa
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10Pa-1000Pa
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Cleaning time
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1~6000ml adjustable
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Gas flow speed
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10~100ml
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Control mode
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Manual control or Programmable control
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Vacuum pump
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CY-4C
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Vacuum chamber temper.
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less than 65℃
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Cooling type
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forced air cooling
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Equipment list
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plasma cleaner:1set; vacuum pump: 1set; vacuum high-pressure hose: 1pc;O type card: 4pcs;pr
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Company Information
