Semiconductor Aluminum Nitride(AlN) Ceramic Equipment Slotted Disc
Product Description:
The process of manufacturing semiconductors includes a harsh environment where plasma is generated. Therefore, the Aluminum Nitride Ceramic with excellent plasma resistance are more suitable for semiconductor manufacturing. What's more, in the fabrication of semiconductors, a combination of volatile precursor gases, plasma and high temperatures are used to lay high quality films onto the wafers. Deposition chambers and wafer handling tools require durable ceramic components to withstand these challenging environments, so the Aluminum Nitride Ceramic Slotted Disc is suitable for the semiconductor industry.
Our Aluminum Nitride(AlN) substrates are available in various sizes and thickness. Thanks to a large and live inventory, we can ship your part fast for you to start your project.
Our Service:
Please contact us for customization.
Specification:
| Dimension(LxW) |
φ170mm etc. |
| Thickness |
7mm etc. |
| Thermal conductivity |
170W/m.K |
| Dielectric Constant |
8-9 (MHz) |
| Bulk Density |
3.3 g/cm³ |
| Surface Roughness |
Ra ≤6 μm on both sides |
Company Advantage:
Huaqing founded in 2004, with sum investment of 80Million RMB, registered capital 40Million RMB. Huaqing's AlN & Al2O3 ceramic products have high thermal-conductivity, low dielectric constant, good dissipation factor and excellent mechanical property compared with the other factories in the industry. AlN & Al2O3 ceramic are widely used in HBLED, opto-communication, IGBT, power devices, TEC and the other high-end applications.
Workshop & Equipement:
Packaging & Delivery:
Deliver by UPS, DHL, Fedex etc.
