Dual-Target DC Magnetron Sputtering Coater



  • Delivery Time6-8 Day
  • Packaging DetailsExport wooden package
  • Voltage108V-240V 50/60HZ
  • Minimum Order Quantity1
  • ComplianceCE Certified
  • Model NumberOLT-GZK103-A

Dual-Target DC Magnetron Sputtering Coater 

Dual-target DC magnetron sputtering coater is equipped with two 500W DC power supply. The DC power supply can be used for the preparation of metal film. The two targets can meet the needs of multi-layer or multiple coatings.

Sample stage

Size

φ185mm

Temperature control accuracy

±1℃

Heating temperature

Max 500℃

Rotate speed

1-20rpm adjustable

Magnetron Sputtering   target head

Quantity

2”×2 (1”,2” optional)

Water chiller

Circulating water chiller   with flow rate of 10L/min

Cooling mode

Water cooling



Vacuum chamber

Chamber size

φ300mm×300mm

Watch window

φ100mm

Chamber material

Stainless steel

Opening mode

Top cover open

Mass flowmeter

2 channels; measuring   range 100SCCM; 100SCCM (can be customized according to customer needs)

Vacuum system

Model

OLT-GZK103-A

Pumping interface

KF40

Molecular pump

OLT-600

Exhaust interface

KF16

Backing pump

rotary vane pump

Vacuum measurement

Compound vacuum gauge

Ultimate vacuum

1.0E-5Pa

Power supply

AC;220V 50/60Hz

Pumping rate

Molecular pump: 600L/S   rotary vane pump: 1.1L/S  

Comprehensive gas pumping performance: vacuum up to 1.0E-3Pa in 20 minutes

Power configuration

Quantity

DC power supply×2

Max output power

DC 500W

Other parameters

Supply voltage

AC108V-240V,50Hz

Overall size

600mm×650mm×1280mm

Total power

2.5KW

Total Weight

About 300kg

The coating machine is equipped with two-channel high-precision mass flowmeter. If you have other requirements, you can customize the gas path of up to four-channel mass flowmeters to meet the complex gas environment construction requirements. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa, and other types of molecular pumps are available for purchase. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving your work efficiency. This product can be equipped with an integrated industrial computer to control the system. In the computer program, most functions such as vacuum pump control and sputtering power control can be realized, which can further improve your experimental efficiency.


This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, and the like. Compared with similar equipment, the dual-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.





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